New Heteroleptic Cobalt Precursors for Deposition of Cobalt-Based Thin Films
نویسندگان
چکیده
منابع مشابه
Direct-liquid-evaporation chemical vapor deposition of smooth, highly conformal cobalt and cobalt nitride thin films
By a direct-liquid-evaporation chemical vapor deposition (DLE-CVD) method, we deposited smooth lowresistance cobalt (Co) and cobalt nitride (CoxN) thin films with excellent conformality at low temperatures down to 200 1C. In the DLE process, a cobalt amidinate precursor solution, bis(N,N0-diisopropylacetamidinato)cobalt(II) dissolved in tetradecane, was vaporized as it flowed smoothly, without ...
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ژورنال
عنوان ژورنال: ACS Omega
سال: 2017
ISSN: 2470-1343,2470-1343
DOI: 10.1021/acsomega.7b00800